26.04.24 | Vollzeit | Oberkochen | ZEISSIt takes less than 10 minutes We develop optical metrology systems based on coherent illumination and detection for the high-accuracy determination of the pose (six degrees of freedom) of workpieces. For maximum accuracy, an optimal design and calibration of the measuring system is necessary. As part
Später ansehen23.04.24 | Vollzeit | Oberkochen | ZEISSIt takes less than 10 minutes. Interferometry is a key technology in the qualification of various optical components and systems. Many of its applications at ZEISS, such as in EUV lithography, require extremely high levels of accuracy, making a detailed characterization of the used measurement device
Später ansehen20.04.24 | Vollzeit | Oberkochen | ZEISSsystems - the essential building block to manufacture defect-free microchips. Your Role Our high-tech measurement systems for semiconductor lithography are characterized by extreme demands on measurement performance. This performance is essentially achieved by optical components at the highest level
Später ansehen20.04.24 | Vollzeit | Oberkochen | ZEISSsystems - the essential building block to manufacture defect-free microchips. Your Role Our high-tech measurement systems for semiconductor lithography are characterized by extreme demands on measurement performance. This performance is essentially achieved by optical components and computational
Später ansehen19.04.24 | Vollzeit, Teilzeit | Oberkochen | ZEISSsystems. These projects range from object classification, transfer learning, synthetic data pipelines and dimensional accuracy measurement What We Offer - An opportunity to build the foundation for next-generation products - The possibility to learn and implement cutting edge 3D computer vision methods
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